型號:EMS150T S 鍍膜儀(通用儀器)簡介: 分子渦輪高真空系統,CPU程序全自動控制,觸膜屏用戶界面,可鍍多種膜材,也可鍍相對較厚的膜。具有快速濺射易氧化和不氧化金屬(貴金屬)靶材的功能,可選各種濺射靶材,包括常用于場發射電鏡的銥和鉻。 可選配一系列可選附件,如:金屬蒸鍍、碳絲蒸鍍、膜厚測量等。 標準配置的樣品臺,無傾角,高度不可調。如果需要傾斜樣平臺,需要另外選擇。 主要技術指標: 1、尺寸和重量:儀器機箱:585mm寬x 470mm長 x 410mm高 (總高: 650mm) 2、儀器總重量:33.4Kg 3、工作腔室:硼硅酸鹽玻璃,152mm(內) x 127mm高 4、觸摸屏全圖像用戶界面 5、樣品臺:標配件(無傾角,高度不可調) ,轉速8-20rpm 6、真空系統: 渦輪分子泵:帶有空氣冷卻的渦輪分子泵(標準配置里面) 旋轉機械泵:雙級旋轉機械泵(需要另購) 7、真空度: 5x10-3-----5x10-1 mbar 8、濺射時間:zui長60分鐘 9、濺射靶材:57mm Ø x 0.3mm Chromium(標準配置:鉻靶材一個) 產品選購: 產品貨號 | 產品名稱 | 產品規格 | 3380 | EMS150T S - High resolution turbomolecular pumped sputter coater, including a 54mm Ø x 0.3mm chromium target | 標準配置 | 91003 | Edwards RV3 50L/s two-stage rotary pump, with vacuum hose, coupling kit and oil mist filter | 個 |
其它附件的選購: 產品貨號 | 產品名稱 | 產品規格 | 3200 | Sputtering head insert suitable for oxidizing and non-oxidizing metals. Supplied with a 54mm x 0.3mm thick chromium target as standard. For additional targets see Sputtering Targets section | 個 | 3210 | Additional sputter insert for quick metal change. Note: this is an entire sputtering assembly. | 個 | 3270 | Extended height vacuum chamber (214mm high – the standard chamber is 127mm high). For increased source to sample distance and for coating large specimens | 個 | 3280 | Vacuum spigot allows more convenient connection of the vacuum hose to the rear of the EMS150T when bench depth is limited | 個 | 3290 | Film thickness monitor (FTM) attachment. Consists of a built in chamber mounted quartz crystal oscillator (includes crystal). As sputtered or evaporated material is deposited onto the crystal, so its frequency ofoscillation is modified. This ‘modification’ is used to measure and control the thickness of material deposited | 個 | 3300 | Spare quartz crystals. Pack of three | 個 | 3320 | Full range vacuum gauge for low and high vacuummeasurement (a low vacuum Pirani gauge is fitted as standard) | 個 | 4513 | Glow discharge insert to modify surface properties (eg hydrophobic to hydrophilic conversion) or to clean surface residues (TS and T ES only). Can be retrofitted | 個 | 3340 | Rotate-tilt specimen stage with adjustable tilt (up to 90 degrees) and height (37mm-60mm). Tilt angle can be pre-set. 50mm Ø specimen platform with six stub positions for 15mm or 6.5mm or 1/8" pin stubs. Stage rotation speed variable between 8 and 20rpm | 個 | 3350 | Variable angle “Rotacota” rotary planetary stage with 50mm Ø specimen platform. Has six stub positions for 15mm or 6.5mm or 1/8" pin stubs. Stage rotation speed variable between 8 and 20rpm | 個 | 3360 | Flat rotation specimen stage for 100mm / 4”wafers, includes gearbox for increased coverage. Stage rotation speed variable between 8 and 20rpm | 個 | 3370 | variable between 8 and 20rpm. Includes gear box to allow optional FTM to be used | 個 |
靶材的選購(舉例如下,實際提供的靶材規格材質更多): 產品貨號 | 產品名稱 | 產品規格 | 3410 | 57mm Ø x 0.1mm,金靶 | 個 | 3411 | 57mm Ø x 0.1mm金/鈀靶(80/20) | 個 | 3412 | 57mm Ø x 0.1mm鉑金靶 | 個 | 3413 | 57mm Ø x 0.1mm鎳靶 | 個 | 3414 | 57mm Ø x 0.1mm銀靶 | 個 | 3415 | 57mm Ø x 0.1mm鈀靶 | 個 | 3416 | 57mm Ø x 0.1mm銅靶 | 個 | 3417 | 57mm Ø x 0.3mm鉻靶 | 個 | 3418 | 57mm Ø x 0.5mm鎢靶 | 個 | 3422 | 57mm Ø x 0.1mm鋁靶 | 個 |
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